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NanoSharp 3D

NanoSharp 3D Optical Prfiler
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NanoSharp 3D Optical Profiler

Technical Information

The NanoSharp 3D, utilizes advanced, non-contact optical technologies to accurately measure surface profiles, roughness, and waviness with nanometer accuracy.

  • White light interferometry (WLI) and Phase Shifting Interferometry (PSI)
  • wide range of sample types, including solids, liquids, and transparent materials
  • better than 5-nanometer axial accuracy
  • better than 635 nanometer lateral accuracy
  • comprehensive software support
  • 20X Nikon Mirau Interferometry Objective

Non-Destructive and Non-Invasive: Preserve the integrity of your samples with state-of-the-art optical measurement technology.

3D Surface Analysis: Accurately map surface features such as fractures, steps, and rapid height variations in high resolution.

Superior Imaging: Achieve depth precision better than 5 nm and measure thin film thicknesses from 30 nm to 1 mm.

High-Speed Data Collection: Analyze complex specimens with superior efficiency compared to similar devices.

Technical Information Document

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3D Surface Profile of Fresnel Lens

Measure Step Height through NanoSharp 3D Software

3D Surface Profile of Thin Film

3D Surface Profile of Fresnel Lens

Accuracy at nano level, precision at every measurement.

  • better than 5 nm depth accuracy
  • 635 nm lateral accuracy
  • 100 nm reproductibility

Comprehensive Software Support

The NanoSharp 3D comes with dedicated and user-friendly software that enables users to seamlessly visualize and analyze surface roughness, profile graphics, and related parameters.

>Surface Roughness Analysis

>Roughness Profiling

>FFT Filtering

>Advanced Measurement Tools

Tip-Tilt Stage with Integrated XY Control for Precise Surface Mapping

>The ±5° tip-tilt stage provides exceptional flexibility in precise angular adjustments, enabling accurate mapping and surface analysis across varied applications

>With integrated control electronics, users can easily manipulate the stage for optimal performance without the need for external devices.

>The stage features a 100 mm x 100 mm platform, designed to accommodate larger sample sizes, making it ideal for applications that require seamless stitching of multiple images or data points.